Thermal Positve Offset CTP Plate
Product Detailed
Easy exposure and procesing.
Compatible with most of the thermal plates and developers available on the market.
| BENEFITS | |
| Easy exposure and procesing.Compatible with most of the thermal plates and developers available on the market.Maximun resolution for the reproduction of stochastic screensFast ink-water balance.Enhanced constrast and stability.Runs more than 100.000 impresions without baking.Cost-efective. CTP-A plate meets user's needs and optimize the printing perfomance. |
| Thermal positive plate to operate in CTP systems with infrared (IR) laser diode between 800-850 nm. No pre-heat required. Anodized non-image area. | ||
| Exposure / Coating Coating colour: blue intense Contrast after development: very high Day light sensitivity: up to 2 hours exposure does not affect the plate Spectral sensitivity: 800-850 nm. Peak sensitivity at 830 nm. Compatible with most of the thermal platesetters: Creo, Heidelberg, Screen, Lüscher, etc... Required energy: 120-130 mj/cm2 Image reproduction: 1-99 % at 250 lines per inch and FM screening Development Use developer Revelith-CTP at 23oC ± 1ºC Compatible with most of the thermal plate developers on the market Development time: 30 seconds ± 5 seconds Replenishment: with the same developer at 120-140 ml/m2 Gumming Use Gomalux-LP When hardened by baking, apply Quemagum-LP Deletion Use deletion pens Dualpoint-LP Baking Hardening the coating by baking enables very long runs, over 500.000 impressions, depending on press conditions. Apply Quemagum-LP Baking conditions: Static oven: 200-230°C during 5-6 minutes On-line oven: 230-250°C during 3-4 minutes | ||
